Excillum is an award-winning pioneer in the field of high-end X-ray sources. Hans Hertz and Oscar Hemberg of the Royal Institute of Technology (KTH) in Stockholm, founded Excillum in 2008. Excillum designs, develops and manufactures a high brightness microfocus X-ray source based on Hertz and Hemburg’s invention. This unique patented technology, MetalJet, is the most fundamental advance in X-ray tube technology since the rotating anode was introduced in 1929, as it can reach previously unprecedented X-ray intensities (up to 10x brighter than conventional X-ray tubes). As an independent X-ray tube supplier, we aim to sell our components to original equipment manufacturers (OEMs) across many sectors. We are following a commercial roadmap to enter sectors where our innovation can add the most value. To date we have sold >50 units (400k€/unit) in the X-ray analytical sector. We are now targeting the semiconductor sector, specifically metrology (measuring and characterizing tiny structures and materials). The need for metrology in the sector is crucial and directly affects yield, and thus costs. With the 3D nanoscale components used in chips today, current metrology instruments such as optical metrology - (relatively) low resolution, high throughput - and scanning electron microscopes - high resolution, low throughput - are struggling to remain viable. Industry experts point to CD-SAXS (Critical Dimension Small Angle X-ray Scattering) as the next-generation metrology solution capable of meeting the demands of the sector. However, CD-SAXS is still at the R&D stage because of a lack of a sufficiently bright X-ray source. MetalJet is the only X-ray source that can take CD-SAXS out of the lab. This project will verify our commercial hypotheses and define the activities and resources needed to adapt MetalJet for integration into metrology instruments. We have received expressions of interest from market-leading sector OEMs, like Bruker, and chipmaker Intel, among others.

The challenges and major HiCONNECTS objectives are to transform the centralized cloud platform to decentralized platforms which include edge cloud computing in a sustainable, energy-efficient way. This will bring cloud services including Artificial Intelligence (AI) closer to the IOT end-users, which enables them to really use the COT and IOT efficiently. The technologies underpinning this revolutionary step include the development of high-performance computing, storage infrastructure, network interfaces and connecting media , and the analysis of IOT sensors and big data in real-time. This major step forward will enable, for example, the mobile clients (during the 5G deployment phase and 6G exploration) to move among different places with minimum cost, short response time and with stable connection between cloud nodes and mobile devices. The main underlying technology to be developed by the HiCONNECTS consortium, comprising large industrial players, universities and RTOs, and many SMEs, can be summarized under the title: heterogenous integration (HI) which is needed to meet the computing power, bandwidth, latency and sensing requirements for the next generation cloud and edge computing and applications. The HI revolution brings the electronic components and systems (ECS) into a new domain, which combines traditional silicon wafers integrated circuit (IC), InP based high speed electronics , and Si and InP photonics devices and interconnect. The HiCONNECTS ambition is to demonstrate, through HI development, a leap in computing and networking reliability and performances across the full vertical and horizontal ECS value chain (i.e. essential capabilities and key applications) in a sustainable way. In addition, HiCONNECTS will focus on the development of next generation design, algorithms, equipment (HW/SW), systems and Systems of Systems (SOS).

The metrology domain (which could be considered as the ‘eyes and ears’ for both R&D&I and production) is a key enabler for productivity enhancements in many industries across the electronic components and system (ECS) value chain and have to be an integral part of any Cyber Physical Systems (CPS) which consist of metrology equipment, virtual metrology or Industrial internet of things (IIoT) sensors, edge and high-performance computing (HPC). The requirements from the metrology is to support ALL process steps toward the final product. However, for any given ECS technology, there is a significant trade-off between the metrology sensitivity, precision and accuracy to its productivity. MADEin4 address this deficiency by focusing on two productivity boosters which are independent from the sensitivity, precision and accuracy requirements: • Productivity booster 1: High throughput, next generation metrology and inspection tools development for the nanoelectronics industry (all nodes down to 5nm). This booster will be developed by the metrology equipment’s manufacturers and demonstrated in an industry 4.0 pilot line at imec and address the ECS equipment, materials and manufacturing major challenges (MASP Chapter 15, major challenges 1 – 3). • Productivity booster 2: CPS development which combines Machine Learning (ML) of design (EDA) and metrology data for predictive diagnostics of the process and tools performances predictive diagnostics of the process and tools performances (predictive yield and tools performance). This booster will be developed and demonstrated in an industry 4.0 pilot line at imec, for the 5nm node, by the EDA, computing and metrology partners (MASP Chapter 15, major challenge 4). The same CPS concept will be demonstrated for the ‘digital industries’ two major challenges of the nanoelectronics (all nodes down to 5nm) and automotive end user’s partners (MASP Chapter 9, major challenges 1and 3).

The objective of the ACT10 project is to develop and demonstrate the required technology options, including their integration, for the 10Ångstrom node. The 32 participating partners cover a wide range of activities along the entire value chain for the manufacturing of CMOS chips. Activities include equipment development, computer aided design tooling and process technology development. Essential parts of hardware, software and processing technology are developed pushing the boundaries of semiconductor design and manufacture to enable the new node and keep Moore’s law alive. The project aims to enhance the attractiveness of the EU as a location for new cutting-edge high volume and legacy node fabs. The ACT10 project is built based on the following four pillars. 1. Lithography Equipment and Mask Technology: Increase key-performance indicators in the optical system of High-NA Lithography machines, along with developing advanced mask processes and equipment to reach optical imaging requirements, and nonlinear optics material lifetime effects. 2. Chip design and Block Level validation; Assessment of different CFET devices and evaluate building blocks for digital and analog IPs. 3. Process Technology: development of innovative solutions for routing of the stacked n- and p-devices of the CFET architecture, development of 0.55NA (high-NA) single patterning solutions, and the development of semi-damascene BEOL for the 10Å node. 4. Computational Metrology and Process Monitoring Equipment: develop computational metrology methods, and develop metrology and inspection modules and equipment.

14ACMOS is about enabling manufacture of 14A Semiconductor technology. It addresses the 4 key pillars in IC technology development for manufacture; Lithography, Metrology, Mask Infrastructure and Process technology. Carl ZEISS, Trumpf and ASML are the main parties to push the lithography solutions to 14A. Between Carl ZEISS, Fraunhofer, RWTH, UW and TNO further understanding of optics life time and plasma physics is pursued in optimizing optics transmission and lifetime. Nova, BRT, ILT and PTB address measurement sensitivity enhancement of X-ray and optical based methodologies to meet the 14A requirements. Imec, TNO, PTB, UPB and RWTH will combine and tune metrology techniques specifically for the assessment of EUV reticle degradation. On throughput and resolution enhancement Bruker, EXC, PTB and AMIL will work on X-ray sources and AMIL, ICT and NFI on e-beam and SPM platforms for in-line metrology. On the reduction of Total Measurement Uncertainty, Prodrive and AMIL cover the development of an ultra-high precision wafer stage and NVIDIA, AMIL and Prodrive the development of a next generation image processing system. In Mask Infrastructure there are FHG (IISB), ASML, Carl Zeiss covering the creation of a simulation based mask repair strategy and with Carl ZEISS, ASML, PI and UPB HW/SW and process technology for particle removal is created and repair durability is covered with Carl ZEISS, ASML, Suss and UPB. Process technology covers the creation of patterning solutions with the involvement of imec and TEL. On active device selection there will be imec, Cadence, IBS, JSR, Recif and TEL with THERMO enabling advanced TEM characterization. Middle Of Line and Back End Of Line solution development is with imec, TEL, Solmates and Coventor for process modules and Cadence the interface with the design community. On Sustainable Semiconductor Technology and Systems there are imec, Recif and ThermoFisher covering sustainable material and processing alternatives.