This proposal describes the third core project of the Graphene Flagship. It forms the fourth phase of the FET flagship and is characterized by a continued transition towards higher technology readiness levels, without jeopardizing our strong commitment to fundamental research. Compared to the second core project, this phase includes a substantial increase in the market-motivated technological spearhead projects, which account for about 30% of the overall budget. The broader fundamental and applied research themes are pursued by 15 work packages and supported by four work packages on innovation, industrialization, dissemination and management. The consortium that is involved in this project includes over 150 academic and industrial partners in over 20 European countries.

Laser-based technologies for creating structures in the range from nanometer up to millimeter size find many applications such as free form optics, photonics, multifunctional surfaces, lab-on-chip, etc. with a global market volume of > 200 billion euros. The original structures know as masters are the first step in the making of tools for key-enabling technologies like injection molding or nanoimprinting. Some of the current limitations in the laser lithography processes are the limited depth of the structures, small area and low speed at process level, high-power consumption in the laser interference lithography, and multiple and expensive processes required for the development of hierarchical multifunctional structures at industrial level. The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with (i) high depth (150 micrometer), ii) dimensions in the range from 100 nm to sub-mm in XYZ, iii) 2D&3D shape on flat surface, (iv) combining parallel & serial patterning, (v) no need for external treatments on samples; vi) increased speed (1 cm2/min) and large area (up to 2000 cm2), vii) > 40% of reduction in the consumption of resources for the whole manufacturing process. The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning. By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will reduce the energy consumption, avoid material waste, decrease costs, and lead time in many applications. The platform will potentiate the possibilities in the sustainable making of high quality, versatile, less costly masters for industrial manufacturing, as demonstrated in 4 use cases (optical lenses, multifunctional riblet structures, virtual reality lens, microfluidic chips).

The 2D Experimental Pilot Line (2D-EPL) project will establish a European ecosystem for prototype production of Graphene and Related Materials (GRM) based electronics, photonics and sensors. The project will cover the whole value chain including tool manufacturers, chemical and material providers and pilot lines to offer prototyping services to companies, research centers and academics. The 2D-EPL targets to the adoption of GRM integration by commercial semiconductor foundries and integrated device manufacturers through technology transfer and licensing. The project is built on two pillars. In Pillar 1, the 2D-EPL will offer prototyping services for 150 and 200 mm wafers, based on the current state of the art graphene device manufacturing and integration techniques. This will ensure external users and customers are served by the 2D-EPL early in the project and guarantees the inclusion of their input in the development of the final processes by providing the specifications on required device layouts, materials and device performances. In Pillar 2, the consortium will develop a fully automated process flow on 200 and 300 mm wafers, including the growth and vacuum transfer of single crystalline graphene and TMDCs. The knowledge gained in Pillar 2 will be transferred to Pillar 1 to continuously improve the baseline process provided by the 2D-EPL. To ensure sustainability of the 2D-EPL service after the project duration, integration with EUROPRACTICE consortium will be prepared. It provides for the European actors a platform to develop smart integrated systems, from advanced prototype design to small volume production. In addition, for the efficiency of the industrial exploitation, an Industrial Advisory Board consisting mainly of leading European semiconductor manufacturers and foundries will closely track and advise the progress of the 2D-EPL. This approach will enable European players to take the lead in this emerging field of technology.