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Excited‐State Topology Modifications of the Dihydroazulene Photoswitch Through Aromaticity

descriptionPublicationkeyboard_double_arrow_right Article , Other literature type 05 Jun 2019 Denmark Publisher:WileyJournal:ChemPhotoChem, volume 3, pages 577-577 (issn: 2367-0932, eissn: 2367-0932,

Authors: Anders B. Skov; Nicolai Ree; Jens Uhlig; Tõnu Pullerits; Mogens Brøndsted Nielsen; Anders S. Gertsen; Anders S. Gertsen; +8 Authors

doi: 10.1002/cptc.201900182 , 10.1002/cptc.201900088

Excited‐State Topology Modifications of the Dihydroazulene Photoswitch Through Aromaticity

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Abstract

AbstractThe front cover artwork is provided by the Hansen and Mikkelsen groups from the University of Copenhagen. The image shows how excited state aromaticity affects the photochemistry of dihydroazulene (DHA). Inducing aromaticity enhances an excited state barrier, so DHA can no longer reach the photoproduct. Read the full text of the Article at 10.1002/cptc.201900088.

Country

Denmark

Related Organizations

University of Southern Denmark
Denmark
King Fahd University of Petroleum and Minerals
Saudi Arabia
University of Copenhagen
Denmark
University of Pisa
Italy
Università degli studi di Salerno
Italy

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Keywords

potential energy surfaces, energy storage, excited state aromaticity, aromaticity, molecular switches

Impact byBIP!

	citations This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).	13
	popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.	Top 10%
	influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).	Average
	impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.	Top 10%