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Room‐Temperature Atomic Layer Deposition of Al2O3: Impact on Efficiency, Stability and Surface Properties in Perovskite Solar Cells

descriptionPublicationkeyboard_double_arrow_right Article , Journal 07 Dec 2016 United Kingdom Publisher:WileyJournal:ChemSusChem, volume 9, pages 3,401-3,406 (issn: 1864-5631, eissn: 1864-564X,

Authors: Malgorzata Kot; Chittaranjan Das; Zhiping Wang; Karsten Henkel; Zied Rouissi; Konrad Wojciechowski; Henry J. Snaith; +1 Authors

doi: 10.1002/cssc.201601186

pmid: 27925444

Room‐Temperature Atomic Layer Deposition of Al2O3: Impact on Efficiency, Stability and Surface Properties in Perovskite Solar Cells

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Abstract

AbstractIn this work, solar cells with a freshly made CH3NH3PbI3 perovskite film showed a power conversion efficiency (PCE) of 15.4 % whereas the one with 50 days aged perovskite film only 6.1 %. However, when the aged perovskite was covered with a layer of Al2O3 deposited by atomic layer deposition (ALD) at room temperature (RT), the PCE value was clearly enhanced. X‐ray photoelectron spectroscopy study showed that the ALD precursors are chemically active only at the perovskite surface and passivate it. Moreover, the RT‐ALD‐Al2O3‐covered perovskite films showed enhanced ambient air stability.

Country

United Kingdom

Related Organizations

University of Oxford
United Kingdom
Brandenburg University of Technology
Germany
University of Oxford
United Kingdom

Keywords

Titanium, Surface Properties, Temperature, Oxides, Calcium Compounds, Electric Power Supplies, ALD, Al2O3, solar cells, XPS, Aluminum Oxide, Solar Energy, perovskite

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