Abstract The advent of UHV medium-voltage electron microscopes has brought the microanalyst to a regime of operating conditions in which electron-beam induced damage can now be introduced to metallic specimens of medium to high atomic number. We report upon calculations of electron-beam-induced atomic sputtering which will have bearing upon the next generation of medium-voltage analytical electron microscopes. The cross-section calculations reported herein have been completed for all solid elements of the periodic table for indicent electron energies up to 1.5 MeV. All computer code needed to duplicate these computations is available through the Electron Microscopy and Microanalysis Public Domain Library (EMMPDL).