Before lower purity, lower cost silicon (Si) materials, such as compensated Si, can play a role in the terawatt-level (TW) capacity of photovoltaics, a better understanding of the fundamental properties of impurities in compensated Si is essential. In this work, high-resolution photoluminescence (PL) has been used to study the charge carrier radiative recombination through Donor-Acceptor pairs (DAPs) in phosphorus (P) and gallium (Ga) co-doped Si material grown for solar cell applications. The high spectral resolution of our PL system, 0.06 meV, enables us to overcome hitherto prior issues of overlapping spectral lines, giving access to extremely fine structures associated with DA pair (DAP) recombination. Our results confirm the presence of three broad bands and a discrete line structure related to DAP luminescence. The comparison of the discrete line structure due to DAPs recombination in the PL spectra with the theoretically predicted one allows the accurate determination of the Ga ionization energy. Temperature-dependent PL is then used to understand the thermally-induced changes in the DAP luminescence. In particular, we observe that the radiative recombination channel remains active for distant DAPs up to ∼40 K, unlike that for close-range DAPs for which the radiative channel is quenched after only slight increases in the temperature range 10–25 K. Furthermore, the analysis of the temperature dependent changes in the PL intensity of the broad DAP bands up to ∼200 K is used to derive the ionization energy of P donors in compensated Si material. In light of this important information, the significance of using high resolution PL to analyse spectral features in compensated Si is demonstrated.