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Electrodissolution of Ti and p-Si in acidic fluoride media: formation ratio of oxide layers from electrochemical impedance spectroscopy

Authors: Frateur I; Cattarin S; Musiani M; Tribollet B;

Electrodissolution of Ti and p-Si in acidic fluoride media: formation ratio of oxide layers from electrochemical impedance spectroscopy

Abstract

The electrodissolution of Ti and p-Si electrodes in acidic fluoride solutions has been investigated by electrochemical impedance spectroscopy as a function of potential E, fluoride concentration, pH and angular speed of the electrode, with the aim of characterizing the oxide layers covering both materials. The impedance diagrams have been analyzed to obtain the low frequency capacitance C lf, the high frequency capacitance C hf and the product R hfI (where R hf is the high frequency resistance and I the steady-state current). In the potential domain where the oxide thickness x is proportional to E, the formation ratio dx/dE has been computed from C lf, C hf and R hfI. The calculated values have been found to be in good mutual agreement and close to the ones found in the literature.

Countries
Italy, Italy, France
Keywords

MECHANISM, N-SI(111), MODEL, DISSOLUTION, [CHIM] Chemical Sciences, SI, NAOH SOLUTIONS, BEHAVIOR, KINETICS, KOH

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    45
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    Top 10%
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citations
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
45
Top 10%
Top 10%
Average