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Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide

descriptionPublicationkeyboard_double_arrow_right Article , Journal 01 Jan 2015 Germany, United States Publisher:Royal Society of Chemistry (RSC)Journal:Energy & Environmental Science, volume 8, pages 2,644-2,649 (issn: 1754-5692, eissn: 1754-5706,

Authors: Ke Sun; Nathan S. Lewis; Bruce S. Brunschwig; Stefan T. Omelchenko; Rui Liu; Kimberly M. Papadantonakis; Fadl H. Saadi; +7 Authors

doi: 10.1039/c5ee01687h

Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide

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Abstract

Interfacial CoOx layers provide a route to stable, high-performance Si photoanodes for water splitting, without requiring np+ homojunctions.

Countries

Germany, United States

Related Organizations

Helmholtz Association of German Research Centres
Germany
Helmholtz-Zentrum Berlin für Materialien und Energie
Germany
Joint Center for Artificial Photosynthesis
United States
Solar Fuels Institute
United States
Joint Center for Artificial Photosynthesis
United States

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Keywords

540, 530, Solar fuels

Impact byBIP!

	citations This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).	127
	popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.	Top 1%
	influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).	Top 10%
	impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.	Top 1%