We present a method for high-rate solution growth of the Zn(O,S) buffer layer to achieve deposition rates and material consumptions far below the standard Zn(O,S) and CdS deposition method. We replace the organosulfide thiourea by the more quickly decomposable thioacetamide and control the reaction kinetics by the use of chelating ligands and ammonia. We characterize the produced layers by secondary neutral mass spectrometry, X-ray diffraction, and optical transmission. For cell preparation, we use high-efficiency Cu(In,Ga)Se2 with an alkali-modified surface, as well as industrially relevant inline absorber material. We realize a certified 21% cell efficiency with the standard thiourea-based Zn(O,S) and first cells with over 19 % with the high-rate Zn(O,S) buffer.