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Free-standing line patterns of nanocrystalline electrodeposits

descriptionPublicationkeyboard_double_arrow_right Article , Contribution for newspaper or weekly magazine , Journal 01 Jan 2004 Denmark Publisher:Springer Science and Business Media LLCJournal:MRS Proceedings, volume 812 (issn: 0272-9172, eissn: 1946-4274,

Authors: Panthleon, K.; Jensen, Henrik Myhre; Somers, M. A. J;

doi: 10.1557/proc-812-f3.20

Free-standing line patterns of nanocrystalline electrodeposits

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Abstract

AbstractFree-standing Cu- and Ni-line patterns with varying line dimensions in the range of a few micrometers were manufactured by means of electrodeposition through a lithographically prepared mask. XRD studies revealed for Cu-lines a pronounced influence of the pattern geometry on crystallographic texture and peak broadening. Information on the strain distribution within individual Cu-lines was obtained from FEM.

Country

Denmark

Related Organizations

Aalborg University Library (AUB) Aalborg Universitet Research Portal
Denmark
Aalborg University Library (AUB)
Denmark
Technical University of Denmark
Denmark
Aalborg University
Denmark
Aalborg University Library (AUB)
Denmark

Keywords

Electrodeposition : X-ray diffraction : Residual strains : Finite element modelling, X-ray diffraction : Residual strains : Finite element modelling [Electrodeposition]

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