This report summarizes the experimental work carried out at the Lawrence Livermore National Laboratory on the electronic structure and reactivity of uranium thin films on Pd, Pt, Si, graphite, Cu, and Au substrates from 1990 to 1993. The U-Pd system was studied in the most detail because it was the first to be chosen right after the completion of the experimental equipment. We first studied and characterized clean U overlayers and the possible surface reactions between this metal and the substrates studied. We then subjected these systems to reactive conditions such as heating and adsorbing corrosive gases (O{sub 2}, CO, CO{sub 2}, and C{sub 2}H{sub 4}). Finally we investigated the diffusion of U metal and some of its compounds into the substrates. A new technique was developed, based on Auger Electron Spectroscopy, to follow in real time the diffusion of U overlayers into the substrate. The temperature of the sample is ramped linearly up to 900{degrees}C while following the Auger peak intensities of the two components for a given system. Diffusion rates are obtained by differentiating the measured intensity curves, then peaks result corresponding to diffusion processes with different activation energies. This technique bears a strong similarity to thermal desorption spectroscopy (TDS), where the sample is heated linearly and the rate of desorption is measured as a function of temperature and heating rate.