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Understanding the electrochemical mechanisms of light induced plating by means of voltammetric techniques

descriptionPublicationkeyboard_double_arrow_right Other literature type , Article , Conference object 01 Jan 2008 Germany Publisher:Fraunhofer-Gesellschaft

Authors: Radtke, V.; Bartsch, J.; Greil, S.; Schetter, C.; Bergander, R.; Glunz, S.W.;

doi: 10.24406/publica-r-361698 , 10.4229/23rdeupvsec2008-2cv.5.61

Understanding the electrochemical mechanisms of light induced plating by means of voltammetric techniques

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Abstract

The requirements for the contact metal deposited on solar cells are rising as the size of solar cells grows. Particularly, the improvement of the electric properties – especially the conductivity – is attracting interest. Light-induced plating is deemed to be a sophisticated approach to deposit a highly conductive metal layer on an arbitrarily generated seed layer. Although already in industrial operation to some extent, the mechanism is not understood in detail. In addition, the aim of avoidance of cyanide containing electrolytes for silver deposition is high. We will show voltammetric techniques are an appropriate approach investigating these topics.

23rd European Photovoltaic Solar Energy Conference and Exhibition, 1-5 September 2008, Valencia, Spain; 1785-1788

Country

Germany

Related Organizations

Fraunhofer Society
Germany

Keywords

Mono- and Multicrystalline Silicon Cells and Materials, Processing Technology of, Wafer-Based Silicon Solar Cells and Materials Technology

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