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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Journal of Materials...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Journal of Materials Science Materials in Electronics
Article . 2020 . Peer-reviewed
License: Springer TDM
Data sources: Crossref
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Enhanced photocatalytic degradation of antimicrobial triclosan using rGO–TiO2 composite under natural solar illumination

Authors: Harkirat Kaur; Rashmi Dahake; Pratap Reddy Maddigapu; Girivyankatesh Hippargi; Girish R. Pophali; Amit Bansiwal;

Enhanced photocatalytic degradation of antimicrobial triclosan using rGO–TiO2 composite under natural solar illumination

Abstract

In the present study, the enhancement in the photocatalytic degradation of triclosan after incorporation of reduced graphene oxide (rGO) in pristine TiO2 is investigated. Triclosan is an antimicrobial compound found in commonly used personal care products. The study involved the synthesis of reduced graphene oxide–titania composite using the improved Hummer and hydrothermal methods. The optimum rGO content in the composite was found to be 10 wt% (RT10). The composite was characterized using X-ray diffraction (XRD), Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR), UV–Vis spectroscopy, Scanning electron microscopy (SEM), and Brunauer–Emmett–Teller surface area (BETSA). The experimental conditions viz. catalyst dose, initial triclosan concentration, and solution pH were studied. The surface area of the composite was substantially higher than either of TiO2 and GO. The photocatalytic reaction followed pseudo-first-order kinetics with the highest rate constant of 0.251 h−1 obtained for RT10. The scavenging experiment indicated the role of hydroxyl radical in the degradation mechanism. The composite displayed efficient degradation under natural sunlight attributed to narrowing of band gap. It also performed effectively in secondary effluent containing triclosan despite matrix effect. Thus, the composite has potential application as a promising photocatalyst in tertiary treatment of water and wastewater.

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    citations
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    19
    popularity
    This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
    Top 10%
    influence
    This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
    Average
    impulse
    This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
    Top 10%
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citations
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
19
Top 10%
Average
Top 10%