• Energy Research

Thin (approximately 10 nm) oxide buffer layers grown over lead-halide perovskite device stacks are critical for protecting the perovskite against mechanical and environmental damage. However, the limited perovskite stability restricts the processing methods and temperatures (<=110 C) that can be used to deposit the oxide overlayers, with the latter limiting the electronic properties of the oxides achievable. In this work, we demonstrate an alternative to existing methods that can grow pinhole-free TiOx (x = 2.00+/-0.05) films with the requisite thickness in <1 min without vacuum. This technique is atmospheric pressure chemical vapor deposition (AP-CVD). The rapid but soft deposition enables growth temperatures of >=180 ��C to be used to coat the perovskite. This is >=70 ��C higher than achievable by current methods and results in more conductive TiOx films, boosting solar cell efficiencies by >2%. Likewise, when AP-CVD SnOx (x ~ 2) is grown on perovskites, there is also minimal damage to the perovskite beneath. The SnOx layer is pinhole-free and conformal, which reduces shunting in devices, and increases steady-state efficiencies from 16.5% (no SnOx) to 19.4% (60 nm SnOx), with fill factors reaching 84%. This work shows AP-CVD to be a versatile technique for growing oxides on thermally-sensitive materials. R.D.R and R.A.J contributed equally. 23 pages. 6 figures

A low temperature (60 °C) encapsulation process based on a single thin (16 nm) coating of Al2O3prepared by atomic layer deposition.

Flexible, lightweight, Cu(In,Ga)Se2 photovoltaic technology is becoming more and more popular, thanks to the very high efficiencies already achieved (>20%) and to the possible employment of roll-to-roll deposition techniques, offering new application opportunities. In this paper, we aim to improve the understanding and performances of recently discovered new front surface engineering approaches. We show that the improvement of Voc generally observed using heavy alkali (below Na) can be boosted by adding indium during the alkali postdeposition treatments (PDTs). The obtained modification of the absorber using NaF/KF + In PDT leads to an improvement of Voc by 20 mV with respect to NaF/KF PDT and by almost 50 mV with respect to NaF-PDT only. The electrical performances of solar cells prepared with different PDTs are analyzed and discussed in light of structural and optical characterization data, supported by physical modeling. We show that KF PDTs modify the absorber over a thin region close to the surface, and also deep in the bulk of the film. Our results with KF show a record efficiency of 18.1% without antireflecting coating (ARC), a value that is close to the highest reported value of 20.4% (with ARC).

Cu(In,Ga)Se2 (CIGS) solar cells have achieved the highest efficiencies among thin-film solar technologies. At low temperatures ( V oc and FF with high Ga content at the interface. We show that the insertion of a Ga-rich layer favors the formation of ordered vacancy compound phases, and the absence of Ga during the last stage of the process impacts the overall element diffusion. Optimized Ga gradient leads to 17.8% efficiency solar cells without antireflecting coating or KF postdeposition treatment.

Abstract Laser contact opening is a critical step for solar cells manufacturing and needs to be optimized to achieve high efficiencies. In this paper, laser contact opening using a picosecond laser (wavelength 355 nm, pulse duration 10 ps) has been carried out on n-PERT precursors composed of a SiOx/SiOxNy stack on the rear polished side and a SiOxNy layer on the front textured side. By varying peak fluence from 0.130 J/cm2 to 2.159 J/cm2 and spot overlapping, ninety parameters combinations have been tested to open these dielectric layers. Surface morphology characterization, before and after laser ablation, has been realized using Confocal Laser Scanning Microscopy and Scanning Electron Microscopy. Bulk and surface compositions have also been investigated by Energy Dispersive Spectroscopy and X-ray Photoelectron Spectroscopy analysis, respectively. Results have shown the existence of four separated laser impacted areas on the polished side and a related ablation mechanism is suggested. Also, electrical characterization using four probe measurements and calibrated lifetime photoluminescence revealed that electrical properties of the silicon underlying increased when post laser annealing was performed associated with no spot overlapping. Then, nickel electroless deposition has been performed and first characterizations indicate adherence issues and inhomogeneous metallization. Characterization of metallized samples revealed that these observations were closely linked to the non-homogenous surface morphology and composition after laser ablation.

Cu(In,Ga)Se2 absorbers were immerged in deionized water for different times, and specific chemical evolutions were monitored thanks to X‐ray photoemission spectroscopy. Cu(In,Ga)Se2 related dissolution products were studied in water through induced coupled plasma optical emission spectroscopy. From those analyses, specific surface network disorganization was observed, with Cu migration towards the surface, leading to different kinetics of oxidation and dissolution for each element that could be quantified.

Indium phosphide (InP) surfaces are greatly affected by ionic bombardment. We investigate the resulting surface perturbation through the use of the complementary analytical techniques of electrochemistry and X-ray photoelectron spectroscopy (XPS). Following bombardment, modifications to the surface were identified by a reduction in the dark open circuit potential in comparison to the pristine state. Through XPS studies, it was found that the sputtered surface was enriched with a metallic-like In contribution, which oxidized upon exposure to air. Cyclic voltammetry measurements confirmed this observation, with initial cathodic features related to an oxidized metallic In-enriched layer on the InP surface. Repeated cyclic voltammetry experiments resulted in the formation of a more In-rich overlayer due to a specific oxidation/reduction phenomenon. This behavior is very similar to that obtained by cathodic decomposition on InP surfaces.